- PII
- S0544126925030029-1
- DOI
- 10.31857/S0544126925030029
- Publication type
- Article
- Status
- Published
- Authors
- Volume/ Edition
- Volume 54 / Issue number 3
- Pages
- 202-212
- Abstract
- This review paper is focused on the structure of thin titanium nitride films formed by magnetron sputtering. A model of film growth depending on the deposition temperature and nitrogen flow is considered. This model is compared with experimental results. The effect of annealing on the structure of titanium nitride films is described.
- Keywords
- нитрид титана магнетронное распыление кристаллическая структура
- Date of publication
- 16.09.2025
- Year of publication
- 2025
- Number of purchasers
- 0
- Views
- 16
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