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Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance
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Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance
Annotation
PII
S0544126924050013-1
Publication type
Article
Status
Published
Authors
А. V. Kovalchuk 
Affiliation: Institute of Microelectronics Technology and High-Purity Materials, Russian Academy of Sciences
S. Y. Shapoval
Affiliation: Institute of Microelectronics Technology and High-Purity Materials, Russian Academy of Sciences
Edition
Volume 53 Issue number 5
Pages
355-361
Abstract
Microwave plasma (generation frequency 2.45 GHz, power 200–1000 W, pressure 0.2–10 mTorr) is excited and maintained in two main modes: (1) at continuous microwave power and low magnetic fields (B = 300–450 G) under a superdense (Ne > Ncr = 7.4 ´ 1010 cm−3) plasma and low plasma density (Ne < Ncr); and (2) in high magnetic fields (B = 750–1000 G), close to the ECR condition. The peculiarities of plasma generation under the ECR condition and at the second harmonic of cyclotron resonance are studied.
Keywords
СВЧ-излучение ЭЦР-плазма вторая циклотронная гармоника КВЧ интерферометрия плазменный зонд
Acknowledgment
The work was carried out within the framework of the state assignment of the Institute of Theoretical and Mathematical Mechanics of the Russian Academy of Sciences No. 075-00296-24-01.
Received
23.02.2025
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References

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